Journal Article

·2003

A new approach to modeling statistical variations in MOS transistors

G. Tulunay , Günhan Dündar , A. Ataman YTU

Abstract

In this paper, a new methodology for modeling transistor mismatch in terms of systematic and random variations is proposed. The model is based on the variations in physical parameters. Although the methodology is the same, regardless of the technology used, the coefficients of the equations used in the model will vary due to the process. Results of the model, and a comparison between the proposed model and the well-known Pelgrom model are presented.

Keywords

Transistor Computer science Process (computing) Transistor model Statistical model Semiconductor device modeling Electronic engineering Engineering Electrical engineering Artificial intelligence Voltage CMOS

Subject Areas

Analog and Mixed-Signal Circuit Design ·Biomedical Engineering ·Physical Sciences
VLSI and Analog Circuit Testing ·Hardware and Architecture ·Physical Sciences
Low-power high-performance VLSI design ·Electrical and Electronic Engineering ·Physical Sciences

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